Manufacturers of optical coatings and components

NTFL UV hot mirrors decrease the amount of visible and infrared energy at the irradiation zone without significantly reducing the UV output of system.  The result is lower temperatures at the irradiation zone, allowing the processing of temperature sensitive substrates.

UV hot mirrors are situated on the output side of the radiation source and are always made of fused silica or quartz.   Figure 1 shows typical UV hot mirror installation locations.  Due to harmonic generation that interferes with UV transmittance, 100% efficient UV hot mirrors are difficult to manufacture.  NTFL UV hot mirrors reduce visible and infrared energy to the irradiation zone by approximately 20% without significantly reducing UV energy.   For systems that require very low processing temperatures, multiple hot mirrors can be used in series to improve visible and infrared rejection.  Figure 2 is a plot of transmittance versus wavelength for one UV hot mirror.  Figure 3 is a plot of transmittance versus wavelength for multiple UV hot mirrors (each hot mirror is an element).

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